Oerlikon Systems recently announced that the Cornell University
Nanoscale Science and Technology Facility (CNF) in Ithaca, New York
has purchased a VERSALINE(TM) deep silicon dry etching system.
This VERSALINE(TM) system will bring new processing capability for
MEMS device fabrication as well as enabling a broad range of nanoscale
science and technology projects. The system incorporates Oerlikon´s
latest Deep Silicon Etch (DSE(R)) technology that provides the etching
precision and process latitude necessary to create the next generation
of nanoscale and MEMS devices.
The Cornell Nanoscale Science & Technology Facility
(http://www.cnf.cornell.edu) is a national user facility that provides
state-of-the-art resources coupled with expert staff as part of the
National Nanofabrication Infrastructure Network (NNIN). This year
marks CNF´s 30th year in operation. Research at CNF encompasses
physical sciences, engineering, and life sciences, and has a strong
inter-disciplinary emphasis. Over 700 users per year (50% of them come
from outside Cornell) use the fabrication, synthesis, computation,
characterization, and integration resources of CNF to build
structures, devices and systems from atomic to micron length-scales.
Dry etching of silicon is one of the critical processes for research
in these areas.
"After an extensive and detailed evaluation of the available deep
silicon etch technology, Oerlikon´s VERSALINE(TM) DSE(R) performance
offered the best combination of outstanding process latitude, mask
selectivity, and high etch rate we require to meet the needs of our
numerous user projects," stated Don Tennant, Directory of Operations
at CNF.
Added Vince Genova, CNF´s engineer responsible for analyzing the
various results, "This state of the art DRIE system also minimized RIE
lag, demonstrated high aspect ratio etching, improved sidewall
morphology, and eliminated common artifacts encountered in DRIE. We
look forward to the tool´s arrival later this year."
David Lishan, Principal Scientist at Oerlikon Systems, states,
"Our collaborations with Cornell goes back nearly a decade and we are
pleased to continue working with Cornell to extend the boundaries of
MEMS and nanotechnology. This opportunity is another example of
Oerlikon´s commitment to advanced research."
Oerlikon (SWX:OERL) is among the world´s most successful
industrial high-tech companies focusing on machine and systems
engineering. Oerlikon stands for leading industrial solutions and
cutting-edge technology in textile production, thin film coating,
propulsion, precision and vacuum technology. As a company with Swiss
roots and a 100-year tradition, Oerlikon, with CHF 4.8 billion in
sales, over 19,000 employees at 170 locations in 35 countries, has
evolved into a global player today.
