Pall Launches Nine New Products at Semicon West to Meet the Fast Changing Needs of the Semiconductor Industry for More Advanced Technologies

The fast growing semiconductor market's move to narrower
linewidths continues to drive the need for new and innovative
filtration technologies that can achieve cleaner and purer fluids.
Pall Corporation (NYSE: PLL), a global leader in microelectronics
technologies, is introducing nine new products that boost process
reliability, reproducibility and productivity and help the industry
meet its changing needs. The new products for chemical, gas,
photolithography and chemical mechanical polishing (CMP) applications
are the latest additions to the Company's extensive portfolio for
improving the economics of integrated circuit and display
manufacturing. They will be showcased at Semicon West starting today.

Chemical Applications

Pall introduces two new membrane technology platforms to meet the
increasing demands of single wafer and batch wet chemical processing.
The UltiKleen(TM) Excellar ER Filter is the first 20 nanometer rated,
all-fluoropolymer filter. It is a new generation of PTFE membrane
design with improved surface kinetics for greater non-dewetting in
aqueous and high viscosity chemicals. This filter brings a new level
of retention to the industry by providing the ability to get beyond
current manufacturing barriers to be able to remove the next level of
contaminants. While the filter features improved retention and
dewetting ability, there is no sacrifice to flow or service life.
Pall is also launching the Ultipleat(R) SP DR Filter, a 30
nanometer rated highly asymmetric membrane filter specifically
developed for wet chemical surface preparation applications. The
filter's unique asymmetric design allows for dual retention, and its
polymer material enables the filter to operate at higher temperatures
than other polymers. The filter also features improved chemical
resistance, a hydrophilic surface and high flow rates.
"UltiKleen(TM) Excellar ER and Ultipleat(R) SP DR Filters
establish new performance benchmarks in the marketplace," says Steve
Chisolm, President of Pall Microelectronics. "Both products are the
result of close collaborative development between Pall's R&D team and
industry-leading chip manufacturers and are process-proven. Customers
have placed advanced orders in anticipation of their commercial
release."
According to the Semiconductor Industry Association, this year,
chip sales will be approximately $250 billion, a 9.8 percent increase
from 2005, as consumer demand for electronic devices continues
unabated.

Photolithography Applications

Pall is also introducing its tightest photolithography filter
ever. The new PE-Kleen Filter, a 10 nanometer rated filter is now
available for a broad range of lithography chemistries including 193
nm and 248 nm photoresists. It is the Company's latest addition to its
high density, polyethylene membrane filter series, and offers
exceptional defect-reducing capability while maintaining extremely low
differential pressures during dispense or chemical processing.
Pall's PE-Kleen Filters have been adopted in many critical
lithography applications and allow customers to adopt even finer
levels of filtration without any sacrifice in pressure drop. In
point-of-use photoresist filtration, lithographers require filters
that offer exceptional defect-reducing capabilities, while maintaining
extremely low pressure during dispensing or chemical processing.
"Over the past several years, Pall technologies have repeatedly
pushed the limits of what's possible in lithography filtration," says
Chisolm. "Our new 10 nm PE-Kleen Filter is a natural progression in
our ongoing efforts to reduce defect densities and size in lithography
processes, and confirms our belief that the physical limitations of
lithography filtration have not yet been reached."
Also for photolithography applications, the Company is introducing
a Water for Immersion System for supplying ultra-clean water, up to 2
L/min, for immersion lithography tools.

Gas Purification/Filtration Technologies

Pall is showcasing three new products from the Company's expanding
family of gas purification and filtration technologies. These include

-- PG Series Gaskleen(R) Purifier Assemblies and Manifolds for
inert, flammable (silane, H(2)), corrosive and hydride gases
capable of handling flow rates up to 1,000 slpm. This new
series of products provides sub-parts per billion removal of
molecular contaminants including moisture, oxygen, carbon
dioxide, carbon monoxide, iron carbonyls and nickel carbonyls.

-- Gaskleen(R) TM Sandwich Filter Assemblies (1 1/8" C-Seal) with
a unique design that allows for easy integration of the filter
assembly between the substrate and another component. The
sandwich filter can reduce the overall length of a gas stick
or permit the addition of another component to an existing gas
stick.

-- The AccuSep(R) SIL Nickel Filter Assembly, designed for use in
ultra-high purity bulk gas applications. This assembly
utilizes the Pall AccuSep nickel filter media, which provides
removal of particles greater than 3nm with a 9-log efficiency.

CMP Applications

Additionally, Pall is expanding its range of tailored, depth-style
filtration products for CMP with the introduction of two new products.
The Profile(R) Sirius Filter, a 0.2 micron rated filter, is optimized
for the retention of oversized, difficult to remove, rigid ceria
particles. Its thicker, greater depth configuration provides increased
performance up to high differential pressures. The StarKleen(TM) QD
Capsule offers quick disconnect fittings for ease of installation
close to point-of-dispense.
"As we celebrate our 60th anniversary, we continue to help our
customers achieve their manufacturing goals by delivering advanced
engineered materials and systems solutions. Our singular focus on
providing customers with filtration, separation, and purification
solutions to make them more competitive is what sets Pall
Microelectronics apart from others," adds Chisolm.
Pall Microelectronics is the global leader in filtration,
separations and purification technologies for the microelectronics
industry. It supports the semiconductor, data storage, fiber optic,
advance display and materials markets with a comprehensive suite of
contamination control solutions for chemical, gas, water, chemical
mechanical polishing (CMP) and photolithography processes.

About Pall Corporation

Pall Corporation is the global leader in the rapidly growing field
of filtration, separations and purification. Pall's business is
organized around two broad markets: Life Sciences and Industrial. The
Company provides leading-edge products to meet the demanding needs of
customers in biotechnology, pharmaceutical, transfusion medicine,
semiconductor, water purification, aerospace and broad industrial
markets. Total revenues for fiscal 2005 were $1.9 billion. The Company
headquarters is in East Hills, New York with extensive operations
throughout the world. Visit Pall at www.pall.com.

Editor's Notes:

-- These products are on display at Semicon West Booth #5656,
Pall executives are also available for interviews

-- Photos and additional information about the new products and
Pall's capabilities for the semiconductor market can be found
at http://www.pall.com/corporate_40410.asp