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FSI International´s 2008 Knowledge Services(TM) Seminar Series Offers Attendees Insight into Surface Preparation Drivers and Processes for Advanced Technology Generations



    FSI International, Inc. (Nasdaq: FSII) announces today the return
    of its successful Knowledge Services(TM) Seminar Series in Tel Aviv,
    Dresden, Grenoble, and adds Milan to the May 2008 series schedule. The
    full-day seminars will focus on surface conditioning challenges and
    solutions, and will feature technical presentations from FSI, major
    semiconductor manufacturers and research facilities, including ST
    Microelectronics, Intel, Qimonda and CEA/Leti. Dr. Srini Raghavan,
    professor of Materials Science and Engineering, University of Arizona,
    will present a short course on "Cleaning Chemistry Compatibility with
    New IC Device Materials."

    "Dr. Raghavan is a well-known expert in the field of applied
    surface chemistry," said Don Mitchell, FSI chairman and CEO. "Dr.
    Raghavan has lectured on a variety of cleaning topics at FSI´s
    Knowledge Services Seminars around the world, and we are pleased that
    he is able to participate again this year." He added, "Our customers
    find the Knowledge Services Seminar Series to be of great value--they
    can collaborate with other industry veterans and learn about specific
    technology challenges and cleaning solutions. By combining Dr.
    Raghavan´s short course with customer presentations, the seminars
    deliver well-rounded coverage of both the theoretical and practical
    aspects of today´s most advanced manufacturing processes."

    Since its introduction in 2004, FSI´s free Knowledge Services
    Seminars have attracted more than 1,500 IC manufacturing engineers and
    managers across Asia, Europe, Israel and the United States. The short
    course is presented in the morning, followed by a technical session.
    The technical session topics will include: cleaning challenges for
    phase change memory, cleaning challenges for DRAM, drivers for low
    silicon loss during cleaning, ashless photoresist stripping, salicide
    formation, single wafer cleaning technology, Cu/Low-k post etch/ash
    cleaning, cryogenic aerosol, batch immersion, wafer reclaim, among
    other important subjects.

    The FSI Knowledge Services Seminar Series 2008 schedule for the
    Europe Middle East Area (EMEA) includes:

    -- Tel Aviv, Israel: 13 May 2008

    -- Milan, Italy: 15 May 2008

    -- Grenoble, France: 20 May 2008

    -- Dresden, Germany: 22 May 2008

    To register for the program, or for additional information on
    specific locations and agendas, please visit the FSI web site at
    www.fsi-intl.com/kssemea08.

    FSI International, Inc. is a global supplier of surface
    conditioning equipment technology and support services for
    microelectronics manufacturing. Using the Company´s broad portfolio of
    cleaning products, which include batch and single wafer platforms for
    immersion, spray and CryoKinetic technologies, customers are able to
    achieve their process performance, flexibility and productivity goals.
    The Company´s support services programs provide product and process
    enhancements to extend the life of installed FSI equipment, enabling
    worldwide customers to realize a higher return on their capital
    investment. FSI maintains a web site at http://www.fsi-intl.com.