Brion, TOOL Corp. Unveil Integrated IC Design Environment



    TOOL Corp. and U.S.-based Brion Technologies Inc. today announced
    the successful development of an integrated IC design environment that
    incorporates both TOOL's versatile layout visualization platform,
    LAVIS, and Brion's highly accurate and ultra-fast OPC and RET/OPC
    verification system, Tachyon.

    This integrated environment is an essential tool for semiconductor
    fabs, photomask shops and fabless IC design houses that pursue design
    for manufacturing (DFM) solutions now and in the future. TOOL and
    Brion have combined LAVIS' large-volume data handling and high-speed
    data display capabilities, which can utilize all the data formats used
    throughout the chip design processes, with Tachyon, a
    manufacturing-proven computational lithography platform that is able
    to execute high-speed, full chip simulation and inspection with high
    precision.

    This integrated environment can first display chip design data
    with LAVIS, conduct lithography simulation of designated areas of that
    design within Tachyon, and then display the results again with LAVIS.
    Because design data and simulation parameters are seamlessly and
    automatically communicated between LAVIS and Tachyon, the user is able
    to easily obtain simulation results without difficult and complex data
    preparation.

    "TOOL and Brion's integrated design environment is most welcome,"
    said Hiroshi Sakuma, general manager of NEC Electronics Corp.'s
    Technology Foundation Development Operations Unit, Design Engineering
    Division. "Hot spots are already becoming an issue with leading edge
    IC designs, and these problems will only increase with future
    technology nodes. The ability to perform Tachyon's high precision
    lithography simulation easily and repeatedly through LAVIS' design
    environment is critical to solving problematic hot spots."

    As chip geometry continues to shrink from 65nm designs to 45nm and
    then 32nm, device patterns are becoming more complex because of the
    optical proximity correction (OPC) used to ensure that sub-wavelength
    features in these patterns are transferred correctly onto silicon. To
    achieve accurate OPC, it is critically important for high-speed,
    accurate simulation to verify design data and OPC data during the
    design process, which is provided by Brion's Tachyon.

    But the complex, aggressive OPC patterns being incorporated into
    today's leading-edge designs can result in skyrocketing increases in
    the data volumes of these designs. In the past this has made data
    handling extremely difficult and time consuming. However, the
    integration of TOOL and Brion's platforms together enables repeated
    high speed simulations and verifications to address hot spots and
    parameter alterations, as well as data modifications, thanks to LAVIS'
    partial editing capability, bringing about substantial improvement of
    design verification turn-around time.

    "It is certainly a pleasure to be able to provide our customers
    with a powerful DFM solution that incorporates Tachyon as well as
    TOOL's excellent layout platform, LAVIS," said Shauh-Teh Juang,
    Brion's senior vice president of marketing and business development.
    "We intend to further strengthen our collaborative effort with TOOL
    and LAVIS to continue to bring the best design and computational
    lithography solutions to our mutual customers."

    "We are very excited to enhance the value of our versatile layout
    visualization platform LAVIS through its integration with Brion's
    award-winning high-performance, high-precision lithography simulation
    engine, Tachyon," said Hideaki Hontao, president of TOOL. "United
    together, we can tackle the design and manufacturing issues facing the
    chip industry today and tomorrow, as we continue our borderless and
    global collaboration."

    The integrated LAVIS/Tachyon environment will be exhibited at the
    EDSFair this month in Yokohama, Japan.

    About Tachyon

    Tachyon is a hybrid computational lithography system used to
    perform OPC and verify RET/OPC through full chip simulation utilizing
    a combination of image-based lithography processing and polygon-based
    data processing.

    About LAVIS

    LAVIS is a versatile and ultra-high speed layout visualization
    platform that supports large data and multiple file formats. Its
    unique display method, coupled with memory management control
    technology, efficiently enables large volume data handling and fast
    display. Most importantly, LAVIS can be used as the common standard
    layout platform for all the IC processes such as design, verification,
    mask data preparation, inspection and failure analysis, thanks to its
    capability to support various data formats, including the GDSII design
    format and e-beam formats thereby making it easy to interface with
    other tools for the entire IC making flow.

    About Brion Technologies

    Brion Technologies is the worldwide leader in computational
    lithography for integrated circuit Lithography-Driven Design and
    Manufacturing(tm). Brion's Tachyon(tm) platform, a highly accurate and
    ultra-fast OPC and RET/OPC verification system, enables a unique set
    of capabilities that address the interrelated challenges of design,
    photomask making and wafer printing for semiconductor manufacturing.
    Headquartered in Santa Clara, CA, Brion leads the worldwide market for
    optical proximity correction (OPC) verification, and is rapidly
    expanding in the OPC market. For further information, visit
    www.brion.com or call +1 (408) 653-1500.

    About Brion Technologies K.K.

    Brion K.K. was founded in Tokyo in November 2005 to offer greater
    support to Brion's design-for-manufacturing (DFM) customers in Japan.
    The company considers Japan to be one of the world's most important
    regions for semiconductor manufacturing technology development,
    especially in the areas of device design, R&D, photomask production
    and lithography exposure tool manufacturing.

    Lithography-Driven Design & Manufacturing and Tachyon are
    trademarks of Brion Technologies, Inc.

    About TOOL

    TOOL is a Japanese software development company focused primarily
    on EDA tool development. Its particular strength is in the area of
    layout design, and has scored a number of achievements in this area
    with its development tool, LAVIS. Solutions to chipmakers' problems
    can be provided by combining TOOL's package-software with its
    custom-tailored software developed to serve a customer's particular
    need. TOOL provides ample experience in this particular area. For more
    information on TOOL and products, Please refer to
    http://www.tool-corp.com.