Empresas y finanzas

Oerlikon Systems Announces VERSALINE(TM) Sale to Cornell University



    Oerlikon Systems recently announced that the Cornell University
    Nanoscale Science and Technology Facility (CNF) in Ithaca, New York
    has purchased a VERSALINE(TM) deep silicon dry etching system.

    This VERSALINE(TM) system will bring new processing capability for
    MEMS device fabrication as well as enabling a broad range of nanoscale
    science and technology projects. The system incorporates Oerlikon´s
    latest Deep Silicon Etch (DSE(R)) technology that provides the etching
    precision and process latitude necessary to create the next generation
    of nanoscale and MEMS devices.

    The Cornell Nanoscale Science & Technology Facility
    (http://www.cnf.cornell.edu) is a national user facility that provides
    state-of-the-art resources coupled with expert staff as part of the
    National Nanofabrication Infrastructure Network (NNIN). This year
    marks CNF´s 30th year in operation. Research at CNF encompasses
    physical sciences, engineering, and life sciences, and has a strong
    inter-disciplinary emphasis. Over 700 users per year (50% of them come
    from outside Cornell) use the fabrication, synthesis, computation,
    characterization, and integration resources of CNF to build
    structures, devices and systems from atomic to micron length-scales.
    Dry etching of silicon is one of the critical processes for research
    in these areas.

    "After an extensive and detailed evaluation of the available deep
    silicon etch technology, Oerlikon´s VERSALINE(TM) DSE(R) performance
    offered the best combination of outstanding process latitude, mask
    selectivity, and high etch rate we require to meet the needs of our
    numerous user projects," stated Don Tennant, Directory of Operations
    at CNF.

    Added Vince Genova, CNF´s engineer responsible for analyzing the
    various results, "This state of the art DRIE system also minimized RIE
    lag, demonstrated high aspect ratio etching, improved sidewall
    morphology, and eliminated common artifacts encountered in DRIE. We
    look forward to the tool´s arrival later this year."

    David Lishan, Principal Scientist at Oerlikon Systems, states,
    "Our collaborations with Cornell goes back nearly a decade and we are
    pleased to continue working with Cornell to extend the boundaries of
    MEMS and nanotechnology. This opportunity is another example of
    Oerlikon´s commitment to advanced research."

    Oerlikon (SWX:OERL) is among the world´s most successful
    industrial high-tech companies focusing on machine and systems
    engineering. Oerlikon stands for leading industrial solutions and
    cutting-edge technology in textile production, thin film coating,
    propulsion, precision and vacuum technology. As a company with Swiss
    roots and a 100-year tradition, Oerlikon, with CHF 4.8 billion in
    sales, over 19,000 employees at 170 locations in 35 countries, has
    evolved into a global player today.